Helping CMP Manufacturers Build a Digitalized Manufacturing Operations Platform
Connecting production equipment, manufacturing processes, and laboratory quality data to support scaled domestic production of critical semiconductor materials Chemical Mechanical Planarization (CMP) is a key process step in semiconductor manufacturing. As an essential consumable in that process, the material performance, machining precision, and batch consistency of CMP polishing pads directly affect downstream wafer fabrication. Unlike conventional manufactured products, CMP polishing pads carry the dual attributes of a semiconductor material and an advanced-materials manufacturing product . From raw materials, pre-mixing, casting, and curing, through slicing, sanding, engraving, cleaning, and lamination to final inspection, the manufacturing process involves large volumes of material parameters, equipment parameters, process parameters, and laboratory test data, placing high demands on product consistency, process stability, and full-process traceability. At the same time, as China's semiconductor supply chain continues to advance self-reliance, critical semiconductor materials including CMP polishing pads are accelerating domestic substitution. The focus of industry competition is shifting from "can the product be developed" to "can it be manufactured stably, with continuously improving consistency and scaled delivery." Against this backdrop, a leading domestic CMP manufacturer partnered with Hegong Software to build, on the RockPlus MOM Manufacturing Operations Management Platform , primarily the RockPlus MES Manufacturing Execution System and the RockPlus LIMS Laboratory Information Management System , connecting shop-floor production, equipment, processes, quality, and laboratory data into an integrated manufacturing and quality management platform covering the entire CMP polishing pad production process. Confidentiality notice: CMP polishing pads are among today's critical "choke-point" semiconductor materials targeted for domestic breakthrough. The project involves the customer's production processes, equipment parameters, and quality data, and carries high technical and commercial confidentiality requirements. This case study therefore does not disclose the customer's full corporate name and consistently refers to it as "a leading domestic CMP manufacturer."